真空蒸着

WordNet

clean with a vacuum cleaner; "vacuum the carpets" (同)vacuum-clean, hoover
the absence of matter (同)vacuity
an electrical home appliance that cleans by suction (同)vacuum_cleaner
a region that is devoid of matter (同)vacuity
the natural process of laying down a deposit of something (同)deposit
the act of deposing someone; removing a powerful person from a position or office (同)dethronement
(law) a pretrial interrogation of a witness; usually conducted in a lawyers office

PrepTutorEJDIC

真空 / 《単数形で》‘空虚',‘空所',空白 / (現実から隔離された)孤立状態 / 《米》=vacuum cleaner / ‘…を'電気そうじ機でそうじする / 電気掃除機をかける
〈U〉廃位;(高官などの)免職 / 〈C〉宣誓供述書 / 〈U〉堆積作用;〈C〉堆積物

Wikipedia preview

出典(authority):フリー百科事典『ウィキペディア（Wikipedia）』「2016/07/03 00:26:51」(JST)

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Aluminising vacuum chamber at Mont Mégantic Observatory used for re-coating telescope mirrors.

Vacuum deposition is a family of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e. vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

When the vapor source is a liquid or solid the process is called physical vapor deposition (PVD). When the source is a chemical vapor precursor the process is called chemical vapor deposition (CVD). The latter has several variants: low-pressure chemical vapor deposition (LPCVD), Plasma-enhanced chemical vapor deposition (PECVD), and plasma-assisted CVD (PACVD). Often a combination of PVD and CVD processes are used in the same or connected processing chambers.

The vacuum environment may serve one or more purposes:

reducing the particle density so that the mean free path for collision is long
reducing the particle density of undesirable atoms and molecules (contaminants)
providing a low pressure plasma environment
providing a means for controlling gas and vapor composition
providing a means for mass flow control into the processing chamber.

Condensing particles can be generated in various ways:

thermal evaporation, Evaporation (deposition)
sputtering
cathodic arc vaporization
laser ablation
decomposition of a chemical vapor precursor, chemical vapor deposition

In reactive deposition the depositing material reacts either with a component of the gaseous environment (Ti + N → TiN) or with a co-depositing species (Ti + C → TiC). A plasma environment aids in activating gaseous species (N₂ → 2N) and in decomposition of chemical vapor precursors (SiH₄ → Si + 4H). The plasma may also be used to provide ions for vaporization by sputtering or for bombardment of the substrate for sputter cleaning and for bombardment of the depositing material to densify the structure and tailor properties (ion plating).

Applications

Electrical conduction: metallic films, transparent conductive oxides (TCO), superconducting films & coatings
Semiconductor devices: semiconductor films, electrically insulating films
Solar cells.
Optical films: anti-reflective coatings, optical filters
Reflective coatings: mirrors, hot mirrors
Tribological coating: hard coatings, erosion resistant coatings, solid film lubricants
Energy conservation & generation: low emissivity glass coatings, solar absorbing coatings, mirrors, solar thin film photovoltaic cells, smart films
Magnetic films: magnetic recording
Diffusion barrier: gas permeation barriers, vapor permeation barriers, solid state diffusion barriers
Corrosion protection:
Automotive applications: lamp reflectors and trim applications

A thickness of less than one micrometre is generally called a thin film while a thickness greater than one micrometre is called a coating.

References

Bibliography

SVC, "51st Annual Technical Conference Proceedings" (2008) SVC Publications ISSN 0737-5921 (previous proceeding available on CD)
Anders, Andre (editor) "Handbook of Plasma Immersion Ion Implantation and Deposition" (2000) Wiley-Interscience ISBN 0-471-24698-0
Bach, Hans and Dieter Krause (editors) "Thin Films on Glass" (2003) Springer-Verlag ISBN 3-540-58597-4
Bunshah, Roitan F (editor). "Handbook of Deposition Technologies for Films and Coatings", second edition (1994)
Glaser, Hans Joachim "Large Area Glass Coating" (2000) Von Ardenne Anlagentechnik GmbH ISBN 3-00-004953-3
Glocker,and I. Shah (editors), "Handbook of Thin Film Process Technology", Vol.1&2 (2002) Institute of Physics ISBN 0-7503-0833-8 (2 vol. set)
Mahan, John E. "Physical Vapor Deposition of Thin Films" (2000) John Wiley & Sons ISBN 0-471-33001-9
Mattox, Donald M. "Handbook of Physical Vapor Deposition (PVD) Processing" 2nd edition (2010) Elsevier ISBN 978-0-8155-2037-5
Mattox, Donald M. "The Foundations of Vacuum Coating Technology" (2003) Noyes Publications ISBN 0-8155-1495-6
Mattox, Donald M. and Vivivenne Harwood Mattox (editors) "50 Years of Vacuum Coating Technology and the Growth of the Society of Vacuum Coaters" (2007), Society of Vacuum Coaters ISBN 978-1-878068-27-9
Westwood, William D. "Sputter Deposition", AVS Education Committee Book Series, Vol. 2 (2003) AVS ISBN 0-7354-0105-5
Willey, Ronald R. "Practical Monitoring and Control of Optical Thin Films (2007)" Willey Optical, Consultants ISBN 978-0-615-13760-5
Willey, Ronald R. "Practical Equipment, Materials, and Processes for Optical Thin Films" (2007) Willey Optical, Consultants ISBN 978-0-615-14397-2

UpToDate Contents

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1. 免疫グロブリン軽鎖（AL）アミロイドーシスおよび軽鎖重鎖沈着症の病因 pathogenesis of immunoglobulin light chain al amyloidosis and light and heavy chain deposition diseases
2. 吸引補助による手術的経膣分娩の手順 procedure for vacuum assisted operative vaginal delivery
3. ピロリン酸カルシウム結晶沈着症の治療 treatment of calcium pyrophosphate crystal deposition disease
4. Clinical manifestations and diagnosis of calcium pyrophosphate crystal deposition (CPPD) disease
5. 免疫グロブリン軽鎖（AL）アミロイドーシスおよび軽鎖重鎖沈着症の予後および治療 prognosis and treatment of immunoglobulin light chain al amyloidosis and light and heavy chain deposition diseases

English Journal

Constructing lanthanide [Nd(iii), Er(iii) and Yb(iii)] complexes using a tridentate N,N,O-ligand for near-infrared organic light-emitting diodes.

Wei H, Yu G, Zhao Z, Liu Z, Bian Z, Huang C.SourceBeijing National Laboratory for Molecular Sciences, State Key Laboratory of Rare Earth Materials Chemistry and Applications, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China. bianzq@pku.edu.cn.
Dalton transactions (Cambridge, England : 2003).Dalton Trans.2013 Jun 28;42(24):8951-60. doi: 10.1039/c3dt50778e. Epub 2013 May 13.
A novel type of NIR-emitting lanthanide complexes Ln(PND)3 (Ln = Nd, Er and Yb) was designed and synthesized based on a tridentate monoanionic N,N,O-ligand 6-(pyridin-2-yl)-1,5-naphthyridin-4-ol (PND). Such complex owns definite charge-neutral, coordination-saturated and mononuclear structure that i
PMID 23665838

Development of Pinhole-Free Amorphous Aluminum Oxide Protective Layers for Biomedical Device Applications.

Litvinov J, Wang YJ, George J, Chinwangso P, Brankovic S, Willson RC, Litvinov D.SourceBiomedical Engineering, University of Houston, Houston, Texas 77204.
Surface & coatings technology.Surf Coat Technol.2013 Jun 15;224:101-108.
This paper describes synthesis of ultrathin pinhole-free insulating aluminum oxide layers for electronic device protection in corrosive liquid environments, such as phosphate buffered saline (PBS) or clinical fluids, to enable emerging biomedical applications such as biomolecular sensors. A pinhole-
PMID 23682201

A multi-scale molecular dynamics study of the assembly of micron-size supraparticles from 30 nm alkyl-coated nanoparticles.

Thompson D, Sikora M, Szymczak P, Cieplak M.SourceTheory, Modelling and Design Centre, Tyndall National Institute, University College Cork, Cork, Ireland. damien.thompson@tyndall.ie.
Physical chemistry chemical physics : PCCP.Phys Chem Chem Phys.2013 Jun 7;15(21):8132-43. doi: 10.1039/c3cp50523e. Epub 2013 Apr 17.
Atomistic and meso scale computer simulations of nanoparticle aggregation are combined to describe the self-assembly of supraparticles in bulk and on surfaces under vacuum conditions. At the nano scale, atomic resolution molecular dynamics simulations provide the structures of 30 nm-diameter nanopar
PMID 23591715